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Agnitron Technology Delivers Three Imperium™ Software Control Upgrades to Customers in the U.S. and Switzerland
Agnitron Technology Delivers Three Imperium™ Software Control Upgrades to Customers in the U.S. and Switzerland CHANHASSEN, MN – October 31, 2026 – Agnitron Technology, Inc. [...]
Agnitron Showcases Ultra-Wide-Bandgap MOCVD Advances at E-MRS 2026
CHANHASSEN, MN – September 2026 — Agnitron Technology, Inc. participated in the 2026 Fall Meeting & Exhibit of the European Materials Research Society (E-MRS), held [...]
Agnitron Technology Expands Semiconductor Footprint with another A300 MOCVD System Sale
CHANHASSEN, MN – September 2026 — Chanhassen, MN — Agnitron Technology, Inc., a global leader in state-of-the-art Metalorganic Chemical Vapor Deposition (MOCVD) equipment and specialized [...]
MOCVD
GOX Series 300
Agilis GOX series equipment can be configured to grow Gallium Oxide and AlGaO alloy-based material systems. Agnitron tools are installed on 4 continents growing world-class wide bandgap material for power devices for numerous labs. Record breading Ga2O3 wide-bandgap materials has been achieved on the Agilis GOX series tools.
Control Software and Automation
Imperium-MOCVD™ Control Software and Automation is a modern Windows operating system based SCADA package for controlling MOCVD equipment and processes. It was developed for extending the life of Legacy MOCVD systems and upgrading these large capital investments with state of art control and data logging capabilities. Imperium-MOCVD™ is a direct replacement for Legacy Emcore, Veeco, Thomas Swan, Aixtron and Structured Material Inc. (SMI) OEM Control Software and Automation and offers many new features setting a new bar for MOCVD control flexibility.
Insitu Monitoring
The Agnitron AgniTemp Multiwavelength Pyrometer. Combines speed and precision, enabling accurate, repeatable measurement and control in demanding MOCVD applications. The high-speed performance is ideal for processes with high susceptor rotation speeds. The AgniTemp unit is remarkably compact and supports multiple simultaneous wavelength measurement. The emissivity corrected pyrometer measures and controls wafer surface temperatures for repeatable, accurate and precise growth process. It provides increased yields due to excellent wafer-to-wafer and run-to-run temperature repeatability and control, eliminates process drift, provides quick turn-around after maintenance, and ensures tools higher uptime.