High Speed Multiwavelength Pyrometer.
Accurate wafer temperature monitoring and control in MOCVD applications.
Combines speed and precision, enabling accurate, repeatable measurement and control in demanding MOCVD applications. The high-speed performance is ideal for processes with high susceptor rotation speeds. The AgniTemp unit is remarkably compact and supports multiple simultaneous wavelength measurement. The emissivity corrected pyrometer measures and controls wafer surface temperatures for repeatable, accurate and precise growth process. It provides increased yields due to excellent wafer-to-wafer and run-to-run temperature repeatability and control, eliminates process drift, provides quick turn-around after maintenance, and ensures tools higher uptime.