Agilis 500

Efficiency meets compact in this record-breaking R&D MOCVD design.

MOCVD in Edina

Can grow suited for various AlN, AlGaN, GaN, InGaN, III-V As/P alloys, MgZnO, ZnO, III-IV compounds, TMD [MoS2, MoSe2, WS2, WSe], ALD, Phosphorene, SiC, and ß-Ga2O3.

Reactor size can vary to fit up to 5 x 2” ø wafers.

Ideal for the growth of UV LEDs, HEMTs, LDs, MWQs, SLSs, Power electronic devices, and 2-D materials.
Custom made to fit your individual requirements, budget, and facility constraints.
Source channels offered with regular, diluted, or double diluted network configurations.
Compatible with solid precursor networks with line and valve heating up to 100 °C.
Fast switching separate vent / run injection manifolds for different group precursors.
Automatically pressure balanced vent / run lines.
Switchable carrier gasses available.
DeviceNet communication for gas panel devices (MFCs / PCUs).
Proprietary close injection showerhead with multiple gas injection zones provides efficient gas consumption.
Can install up to 8 sources per gas cabinet.
Additional cabinet for more MO sources can be added per the modular design with up to 12 MO sources.
Modular design allows for switching MO sources in minutes.
Compact design provides reliable processing and requires minimal maintenance.
Segmented cabinet allows for easier delivery and system placement in laboratory.
Entire gas panel / reactor / exhaust system / electronic panels are all enclosed in the facility exhausted system cabinets.
Versatility enables rapid and economical material growth for research and concept demonstration.
Design provides growth uniformity better than 1.5%.
Optional Piezocon MO flow monitoring with automated feedback control of precursors flows during recipe execution.
System can be specifically optimized to necessary Suitable of low-pressure processes.
Optimize to minimize gas phase reaction. This allows for the growth of materials that are typically difficult in standard
Could fit multiple reaction chambers within glovebox.

Wafer speeds up to 1500 RPM.

Propriety restive heating of the wafer carrier up to 1200 °C.

Two systems can be connected via a transfer arm to double the capabilities of the system.

Can be designed with glovebox for atmosphere free wafer loading.
System can be configured to utilize pump and purge glovebox and antechamber.

Please see parts / services tab in Agnitron’s website.
Agnitron sells custom wafer carrier designs that can be optimally designed to meet customer specifications.
*Present examples of all unique / standard NRL wafer carriers including design with bump*

Precision control and awareness of system performance are critical to advanced processing:

Agnitron supplied MOCVD systems are integrated with Imperium® Process Control Software and Automation and Beckhoff Automation PLC hardware. This combination represents a robust architecture with tremendous flexibility to support your process wherever your data leads with digital device communication enhancing recipe editing and data analysis.

Combine the power of advanced metrology and Imperium® for precision monitoring and control:

Imperium® Control Packages can be seamlessly integrated with a variety of in-situ metrology tools such as reflectometry and Emissivity Compensated Pyrometry (ECP) from all leading suppliers for monitoring and / or feedback control operation. Of course, Agnitron’s own leading ECP (AgniTemp®) is available to all customers as well. To increase temperature stability and process reproducibility Imperium® is offered with closed-loop feedback control of temperature during recipe execution using either emissivity corrected, or non-emissivity corrected pyrometers.

Safety is paramount and reliability is key:

System includes hazardous gas detection and safety alarms. The Imperium Control Software and Automation and Beckhoff PLC architecture offers a streamlined Windows OS based control environment and supports all industry standard analog and digital device and drive communication protocols. The Beckhoff proprietary TwinCat3 environment offers a software-based PLC function to ensure maximum control system stability. Even to the extent that if window’s environment “blue screens” during recipe execution of the system, the process will continue to run autonomously unaffected and complete the run safely Using latest industry automation control communication for gas panel devices (MFCs / PCUs).

All purchased Agilis 500 MOCVD systems include the following standard factory and field support services to help customers quickly start materials study and keep equipment operating:

  • Operation and maintenance training at Agnitron facility
  • Pre-shipment qualification and checkout
  • Documentation and remote support for facility requirements/preparation
  • System startup and growth demo at customer site
  • Standard bronze system warranty (upgradeable per request)

Ongoing parts and field services support. This is helped Agnitron maintains a seasoned staff of mechanical engineers and technicians as well as Chemical Engineer trained process engineers. The Agnitron team has more than a century of experience in the principals alone. Agnitron provides a long-term approach to its spares and service business, and we can accommodate a variety of arrangements to be sure our customers are sufficiently supported remotely and on-site.

One of the best ways to keep any MOCVD tool at peak production is through preventive maintenance. Agnitron supports these services worldwide as well.

Have Questions?

Do you still have questions about Agnitron’s MOVCD systems, control software and automation, insitu monitoring or parts and services? We can help!

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