Agnitron Technology successfully completes the install of its Agilis 100 MOCVD System at IFW-Dresden

October 24, 2025 – Agnitron Technology, a leading provider of custom Metal Organic Chemical Vapor Deposition (MOCVD) systems is please to note it has successfully delivered and installed one of its Agilis 100 tool at the Leibniz Institute for Solid State and Materials Research (IFW Dresden) in Germany.

The Agilis 100 system was provided to support IFW Dresden’s novel precursor technology developed at the institute, enabling innovative epitaxial processes for next-generation semiconductor applications.

Installation was completed in October, coinciding with IFW Dresden’s ribbon-cutting ceremony for the opening of its new research facility, the MOCVD and ALD Competence Centre at IFW Dresden. The event marked a significant milestone in the institute’s capabilities for advanced materials development, with the Agilis 100 serving as a key centerpiece of the celebration.

A standout feature of this Agilis 100 system is its unique high-temperature metal organic precursor delivery apparatus. Its advanced design ensures efficient and controlled precursor delivery directly to the showerhead and growth chamber, optimizing growth conditions for high-quality ScAlN and other new semiconductor materials.

Agnitron is thrilled to have delivered this tool to IFW-Dresden.  The integration of our specialized high-temperature delivery technology with their innovative precursor advancements highlights the Agilis 100’s flexibility and performance in pushing the boundaries of semiconductor research.

The Agilis 100 platform continues to be a preferred choice for R&D institutions worldwide, offering modular design, proven material quality, and adaptability for wide bandgap and ultra-wide bandgap materials.

For more information about Agnitron Technology and the Agilis series of MOCVD systems, please visit www.agnitron.com.