Agnitron Installs Agilis 100 Gallium Oxide MOCVD System at Cornell University

Agnitron Technology Inc. is pleased to announce the recent installation and successful, high-quality growth demonstration of an Agilis 100 Metal Organic Chemical Vapor Deposition (MOCVD) system at Cornell University. (Link) Dr. Hari P. Nair – Assistant Research Professor Of Materials Science and Engineering at Cornell’s Duffield Hall Laboratory, has partnered with Agnitron to provide a state-of-the-art system to enable exploration of ultra-wide band gap semiconductor materials. The Agnitron Agilis 100™ system delivers multiple, best-in-class capabilities that support research and development of oxide semiconductors. The system can reach substrate temperatures exceeding 1500°C (2700°F) and keeping it within +/- 1.0°C, and has the ability to grow advanced epitaxial semiconductor layers at unmatched purities and rates.

Dr. Nair’s partnership with Agnitron will continue and build upon Cornell’s long and storied sixty-plus year tenure as one of the world’s leading semiconductor research institutions. The cutting-edge materials developed in the lab at Duffield Hall will enable the crucial, next-generation technologies the world desperately needs for high-power electronic systems. The array of potential uses is enormous and growing daily – electric vehicles, renewable energy solutions, next-gen cellular communications, and many more. The team at Agnitron is deeply honored to have been selected to take part in this lineage and greatly looking forward to the research that Dr. Nair and his team will advance.

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