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The Agnitron Technology Hydride Vapor Phase Epitaxial (HVPE) system, named Aura, is designed for epitaxial growth of III-N based layers, multilayer structures and quasi-bulk (free standing) materials for research and development (R&D) projects. Aura’s economical system platform provides flexibility to grow from microns to hundreds of microns thick GaN and other III-N layers and is optimized for growth of starting substrate materials and advanced device structures for optoelectronics or high-power electronics devices.

III-N Material Growth Applications

Thick layer templates to use for heterostucture growth by MOCVD/MBE
GaN continuous layers and nanowires
Seminsulating GaN templates for high power HEMTs
AlGaN templates for UV LEDs
GaN and AlN on silicon
Free standing III-N material

GaN/AlGaN and GaN/InGaN Structure Growth Applications

Schottky diodes
Spintronic devices

System Design Concept

The Aura HVPE system was inspired by needs of researchers including design elements that limit gas consumption and deliver a system that is affordable to startup and has a low cost of ownership. Aura’s design is optimized for reproducibility of all HVPE processes with special focus on multi-layer structures and thick layer growth. Parasitic deposition is generally the main obstacle that limits thick layer growth in HVPE reactors; Aura delivers highly reproducible growth with reactor and furnace units that are specially designed to control and minimize parasitic deposition on reactor walls and to avoid clogging the exhaust line. Additionally, the reactor quartz-ware is designed for fast and easy disassembly for service and maintenance. The system’s modular design also allows for swappable or multiple reactors making it the most flexible III-N HPVE platform available.

Main System Features

  • Type:  horizontal
  • Material: quartz tube assembled with inserts of quartz ware and secured between a set of stainless steel flanges.  The reactor is easily assembling and disassembling during maintenance
  • Capacity: 1-2  by 2-inch substrates or 1 by 4-inch substrate (optional)
  • Substrates: sapphire, silicon, and other substrates that are suit for the III-N process
  • Process temperature: 600 C-1100 C
  • Process pressure: atmospheric or low pressure option
  • Furnace: two resistive furnaces
  • Precursors: elemental Ga, Al, and In/InCl3
  • Carrier gases: N2 or Ar, H2
  • Active gases: HCl, NH3
  • Doping elements: Si, Mg, Zn, Mn, Fe, Cr (integration of additional precursors easily accommodated)
  • Hazardous gas detection sensors and alarms
  • Windows based PC with Intel Core i7 processor and Agnitron’s premier IMPERIUM™ control software
  • Standard system safety interlocks integrated into IMPERIUMTM control software
  • Three sensors to check background concentration of O2 and three sensors to check background concentration of H2 in supplying gases (N2 or Ar, HCl, NH3, optional)

Active Gases

Hydrogen chloride (HCl) gas: 3 lines
Ammonia (NH3): 2 gas lines

Doping Gas

Silane (SiH4) for n-type doping : 1 gas lines

Carrier Gases (for purging of the reactor and gas lines for active and doping gases)

Nitrogen (N2) or Argon (Ar): 7 gas lines

Control Rack 

Power supply for the furnace and the chiller
Power supply for elements of the gas handling system
Power supply for glove box and vacuum loadlock
Controllers for pneumatic systems (valves)

Glove Box/ Reactor Load Lock Option

Nitrogen purged (1 gas line) glove box with a vacuum loadlock

Exhaust Gas Condition System (optional)

Trap for ammonia chlorides
Wet or dry Scrubber

Gas Cabinet for HCl (optional)

One- or two-cylinder Gas cabinet purged by N2

Gas Cabinet for NH3 (optional)

One- or two-cylinder Gas cabinet purged by N2

System Foot Print 

Reactor: 1.2 m x 2 m (without load lock)
Glove box: 1.2 m x 1.5 m
Control rack 0.8 m x 0.5 m
For more information please Contact Us by email or phone at sales@agnitron.com or 952-937-7505.


Control Software Info Sheet
Imperium-MOCVD™ is a windows based software package developed for extending the life of proven legacy MOCVD systems and offers the latest in advanced process and equipment control technology.

MOCVD System Upgrades
In contrast to other legacy equipment vendors Agnitron offers already upgraded and customized systems located at out facility in Eden Prairie, MN. Systems are powered up and available for demonstration.

Control Software Info Sheet
Imperium-MOCVD™ is a windows based software package developed for extending the life of proven legacy MOCVD systems and offers the latest in advanced process and equipment control technology.