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Agnitron To Supply MOCVD System To University For Oxide Film Growth

Agnitron Technology has been selected by an Eastern US University to supply a custom R&D MOCVD system to support an advanced oxide material research and development program at the University. The supplied system is a high-speed rotating disc reactor configuration and offers 3×2″ wafer loading for β-Ga2O3, ZnO/MgZnO, and related materials film growth.  The system is custom configured for use with a variety of precursor channels including a liquid H2O source as an alternative oxygen source of interest for advanced materials growth capability.

The system is also supplied with Agnitron’s state-of-the-art Imperium-MOCVD™ Control System. The Imperium platform is a Windows 7 based package and is used for controlling MOCVD and other semiconductor process equipment (Windows 10 compatible version available in 2016). Imperium-MOCVD™ is a direct Control Software replacement for Emcore, Veeco and Thomas Swan MOCVD systems and it offers the latest in control technology; setting a new bar for MOCVD control flexibility. It was developed in response to demand for upgrading legacy MOCVD tools for state of the art processing and extends the life of proven MOCVD platforms no longer supported by the OEM. Visit our Gen 3 Imperium-MOCVD™ control software page to view current information, as we offer a brochure and data sheet for customer inspection. Contact us today to setup an online live Imperium demo.

We at Agnitron Technology, Inc. specialize in developing emerging compound semiconductor material and device technologies into commercial products as well as economical custom MOCVD equipment solutions. Our diverse team and partners draw from backgrounds in physics, materials science, semiconductor processing and electrical and mechanical engineering. Collectively, this team is credited with more than 400 published manuscripts and over 50 patents. Visit www.agnitron.com for more information.